Quantum, Photonic Devices and 2D Materials

Abstracts

ALD and ALE for Quantum Devices
Dr Russ Renzas, Oxford Instruments Plasma Technology

Quantum device losses are predominantly from surfaces and interfaces. Atomic layer deposition (ALD) enables tuneable low loss materials, such as superconducting nitrides with engineered crystallinity and in-situ isotropic atomic layer etch (ALE) capability to potentially engineer interfaces prior to deposition and modify films in-situ for superconducting quantum applications, as well as to potentially remove etch-induced interface damage in other applications, such as single photon emitters. Anisotropic ALE may reduce and remove TLS resulting from RIE-induced subsurface amorphization and etchant incorporation, which is useful for applications such as color center-based quantum devices (diamond and SiC). This talk will focus on the potential of ALD and ALE to solve critical problems in quantum device fabrication.

Enabling quantum technology research with Oxford Instruments NanoScience - Cryogenics for Quantum Devices
Dr Harriet van der Vliet, Oxford Instruments NanoScience

Oxford Instruments will present the latest in technology and applications with Oxford Instruments’ family of next generation dilution refrigerators, Proteox and some of the features that make this system perfect for a multi-user and multi-system lab. We will also discuss our latest customer systems and projects within the quantum ecosystem.

Photonic Device Fabrication
Dr Katie Hore, Oxford Instruments Plasma Technology

The applications for photonic integrated circuits is growing rapidly. Dr Katie Hore will talk about plasma processing of In- and Ga-based compounds for a variety of devices including lasers, photodiodes and VCSELs. It is essential to control the critical dimensions of these materials during fabrication to achieve the desired device results. She will focus on how to achieve the required profiles, excellent surface quality and low device damage. Dr Katie Hore will also talk about processing less common materials for photonics applications such as CMT and lithium niobate.

2D Materials and CVD
Dr Owain Thomas, Oxford Instruments Plasma Technology

Graphene and hybrid nanomaterials such as Transition Metal Dichalcogenides (TMDs) have revealed unforeseen electrical, optical, and mechanical properties which make them unique candidates for next-generation nanotechnology devices, ranging from large scale consumer devices to quantum electronics. Traditional vapour-phase synthesis methods of bulk semiconductors have recently undergone a resurgence of research interest for the growth of low-dimensional materials and heterostructures. In particular, Chemical Vapour Deposition (CVD) has been extensively investigated to achieve materials with atomic planes of Van der Waals solids. Of special interest are heterostructures created by stacking atomic layers of different materials with complementary characteristics to achieve novel functionality.

Oxford Instruments Plasma Technology is at the forefront of successful scaled-up wafer-sized deposition of these materials. I will give an overview of our nanomaterial processing capabilities including CVD and Plasma Enhanced CVD (PECVD) deposition of TMDs such as WS2 and 2D heterostructures such as graphene and MoS2 and introduce our developments in technology for the fabrication processes of 2D materials-based devices.