Maximize performance of GaN power electronics and increase consistency, quality, and longevity of devices

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This webinar will be conducted in Korean

2:00pm Korea/Japan | 1:00pm Singapore/Taiwan | 3:00pm Sydney | 5:00pm New Zealand

Oi Academy | Webinar
Maximize performance of GaN power electronics and increase consistency, quality, and longevity of devices

Plasma technology is used in the fabrication of most semiconductor devices created today across a wide range of industries. It is able to provide unique solutions for the creation and manipulation of matter with atomic-scale accuracy. The related applications for such technology could be:

  • Power Devices
  • Quantum Technology
  • RF Devices
  • VCSELs (Vertical-Cavity Surface-Emitting Lasers)


In this webinar, you’ll learn:

  • Atomic Layer Deposition and Atomic Layer Etching technologies for GaN HEMT power electronics manufacturing
  • What is an automatic endpoint detector and how does it work?
  • Optimal processing with automatic endpoint detector
  • Case studies

The presentation will be conducted in Chinese, with real-time translation and captioning provided in English and Korean. 此次演講將以中文進行,但同時會有英語和韓語的即時翻譯和字幕可供選擇。이번 웨비나는 중국어로 진행되며, 실시간 영어 및 한국어 자막이 제공됩니다.


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On Demand
Time:

On Demand

Duration:

1 hour

Language:

Chinese

Businesses:

Plasma Technology, OI Academy

Watch On Demand

Speakers

Bruce Sun - Oxford Instruments
Senior Field Application Engineer, Plasma Technology
Hank Lin - Oxford Instruments
Sales Manager, Plasma Technology

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