Semiconductor fabrication is a complicated process which requires precise control and analysis to maximise device performance. Here in Oxford Instrument, we work across multiple business units to offer solutions in semiconductor fabrications, characterization, and failure analysis.
This webinar will show how we can help you manufacture high quality semiconductor devices using etch and deposition techniques. We will then explore innovative imaging and analysis techniques to understand and confirm that the device contains the desired properties. Finally, we will cover techniques used to identify device defects and analyse device failures.
The webinar includes the following key learning points:
On Demand
On Demand
Duration:45 minutes
Language:English
Businesses:Plasma Technology, NanoAnalysis, Asylum Research
Time (BST) |
Talk Title |
Presenter |
15:00-15:05 |
Introduction to the webinar |
Keith Taylor |
15:05-15:20 |
Plasma and its Role in Semiconductor Device Manufacturing |
Geoff Hassall |
15:20-15:35 |
AFM Applications on Semiconductors |
Ted Limpoco |
15:35-15:50 |
Introduction to EDS, EBSD and Nano Manipulators for the Semiconductor Industry |
Keith Dicks |
In this talk, we'll review conventional plasma-based manufacturing methods and provide the context for how they must evolve to be able to support semiconductor development at the nanoscale and beyond. We will look at how these techniques have changed to meet the needs of modern semiconductor manufacturing technology and ask the question, “what next?”.
Energy Dispersive Spectroscopy (EDS) of x-rays and Electron Backscatter Diffraction (EBSD) in the SEM are indispensable analytical techniques, providing quantitative chemical and structural analyses down to a nanometre scale, combined with the imaging capabilities of the electron microscope.
This talk will introduce the theory, the detectors and the applications relevant to the different steps of the semiconductor production process.
Continuous downscaling of semiconductor technology nodes impose ever more stringent requirements on metrology and failure analysis tools.
In this talk, we will cover how atomic force microscopes (AFMs) can be used in process control, defects identification, and in the R&D of new materials. We will demonstrate how AFMs’ unmatched sub-nanometer resolution and wide variety of electrical measurement modes make it an essential characterization tool in present and future devices.
Geoff is a plasma physicist by training; a scientist, an engineer and technologist during the day but, at heart, he is an inven...
Keith has worked in materials characterization his entire career, first working at Fulmer Research Institute in 1973 as a Resea...
Dr Ted Limpoco is an Applications Scientist at Oxford Instruments Asylum Research. He has over 10 years of AFM experience in na...
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