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POWER DEVICES

How To Plasma Etch Silicon Carbide To Achieve Maximum Device Performance

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  1. Home
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  3. How To Plasma Etch Silicon Carbide To Achieve Maximum Device Performance

Silicon Carbide (SiC) is becoming well established within power device manufacturers as it offers compelling advantages vs Si in several applications.

Manufacturing SiC devices require expert knowledge of plasma processing techniques in order to maximise device performance, watch this webinar to discover more about these techniques.

In this webinar, you will learn:

  • How to achieve precision features on SiC surfaces
  • Fast and efficient plasma etching techniques to achieve deep SiC vias
Watch on demand
On Demand
Time:

On Demand

Duration:

30 minutes

Language:

English

Businesses:

Plasma Technology

Speaker

Dr Mark Dineen - Oxford Instruments Plasma Technology
Technical Marketing Manager

Dr Mark Dineen has over 20 years of plasma processing experience. His more recent work includes applying this knowledge to a wi...

 

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