Indium phosphide (InP), the direct bandgap semiconductor, has multiple uses in optical and electrical devices. For a good quality final product, the InP dry etch step must repeatedly give the desired etched structures.
For many devices, the low surface damage and the surface quality of the sidewalls and base are particularly important.
In this webinar, our Senior Applications Engineer, Dr Katie Hore, will describe two InP etching processes, CH4/Cl2/H2 and Cl2/Ar and the process conditions which will affect the final etch product focusing on sidewall and surface quality, with device examples. She will also detail the uses of optical and laser endpointing for InP etching.
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On Demand
On Demand
Duration:45 minutes
Language:English
Businesses:Plasma Technology
Dr Katie Hore is the Commercial Solutions Team Leader for Optoelectronics, and Power and RF at Oxford Instruments Plasma Techno...
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