02 October 2018 | 08.30 - 17.00

Hosted by CNR IMM
via Gobetti 101 - 40129 Bologna, Italy

This workshop is open to all those people working in industry and academia, with an interest in recent progress in research and development, plus future trends in the fabrication and application of micro & nano structures and devices.

Agenda: 

09.00 - 09.30 | Registration & Coffee
09.30 - 09.45 | Welcome & Presentation of It-Fab & EuroNanoLab | Vittorio Morandi, CNR IMM Bologna
09.45 - 10:00 | Welcome & Introduction | Monica Fachinetti, Oxford Instruments Plasma Technology
10.00 - 10:30 | Advanced laser fabrication solutions | Robert Gunn, Oxford Instruments Plasma Technology
10.30 - 10.50 | Optimised via hole processing for GaAs & GaN/SiC devices | Andrea Lucibello, LeonardoSpa
11.20 - 11.50 | RIE for Silicon Photonics | Dr Zhong Ren. Oxford Instruments Plasma Technology
11.50 - 12.20 | DRIE for MEMS devices: process developement at FBK | Micro-Nano Fabrication facility Alvise Bagolini, MNF-FBK
12.20 - 12.50 | Dielectric Deposition by Liquid Source PECVD | Stefano Tirelli InPhotec – TeCIP Institute Pisa
12.50 –14.00 | Lunch
14.00 - 14.30 | Key plasma processing solutions to produce WBG RF and Power devices | Dr Andrew Newton, Oxford Instruments Plasma Technology
14.30 - 14.50 | Some examples of RIE use in Polifab | Claudio Somaschini, PoliFab - Politecnico di Milano
14.50 - 15.10 | Cryo- and Bosch-DRIE Processes for Demanding Top-down Approaches in
MEMS Fabrication/ Dry Etching for MEMS applications | Dr Zhong Ren, Oxford Instruments Plasma Technology
15.10 - 15.30 | Combination of isotropic/anisotropic silicon dry etching for microfluidic applications | Fulvio Mancarella, CNR-IMM Bologna
16.00 - 16.30 | 2D materials & heterostructures device fabrication techniques: CVD, PECVD, ALD, ALE | Robert Gunn, Oxford Instruments Plasma Technology
16:30 - 17:00 | Close & questions