Meet Oxford Instruments at AVS ALD/ALE 2025
The AVS 25th International Conference on Atomic Layer Deposition (ALD 2025) featuring the 12th International Atomic Layer Etching Workshop (ALE 2025) will open its doors from 22nd to 25th June 2025. This event will focus on the science and technology of atomic layer controlled deposition of thin films and atomic layer etching.
Oxford Instruments Plasma Technology team is looking forward to welcoming you to the event, to discuss your current projects and workflows. If you would like to book a meeting with us during the event, please complete the form below.
We are honoured to announce that our expert Dr Harm C.M. Knoops, will be one of the ALE invited speakers at the conference. He will also be one of the moderators for the Atomic Layer Etching Applications sessions.
Additionally, during the conference, Dr Adriaan J.M. Mackus, Eindhoven University of Technology (TU/e) will deliver a talk based on the abstract of our Dr Nick Chittock, on the subject below.
For further information, visit the AVS ALD/ALE 2025 website and visit AVS ALD/ALE Program 2025.