• Home
• Our Business
• Products
• Contacts
• Press
• Events
• Careers

• Print This Page

Processes

• Aligned carbon nanotube (CNT) growth
• Wide range of nanowire materials
• Si, Ge, ZnO, GaO, SiC, GaN, GaAs, GaP, InP, ZnS, InN
• Proven repeatable processes
• Control of length and diameters
• Catalyst annealing
• Improved catalyst activation by plasma treatment

• PECVD Technology

Nanofab process tool features

Nanofab700

• Flexible nanowire and nanotube growth up to 650 °C
• Liquid precursor option
• Plasma catalyst conditioning
• Standard PECVD with appropriate gases
• Load lock

Nanofab800Agile

• Flexible non-oxide nanowire and nanotube growth up to 800°C
• Agile heating and cooling for rapid turnaround
• Liquid precursor option
• Plasma catalyst conditioning
• Standard PECVD with appropriate gases
• Load lock
• Electrode Features
• High temperature capability: up to 800°C
• Fast cycle times: ramp rates up to 130°C/min
• Thermal uniformity (< ±1%)
• Long life: shock resistant materials
• Renewable susceptor
• Independent lower electrode earthing
• Simple design for ease of service
• Thermal Response
• A key advantage of Oxford Instruments’ technology is the use of low thermal mass, shock resistant materials, capable of high power densities. Ramp rates for heating have been demonstrated as high as 130 °C/minute using our custom designed PBN plate based heater while conventional sintered ceramics are limited to ~15 °C/minute.

Product finder