Oxford Instruments specialises in the design, manufacture and support of innovative solutions, tools and systems for the emerging nanotechnology markets in areas such as XRF (X-ray Fluorescence) analysers , microanalysis systems, superconducting wires, NMR (nuclear magnetic resonance) magnets, cryogenic systems, plasma etch and deposition low temperature environments and coating thickness measurement.

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Nanostructure growth

Carbon nanotubes (CNT) grown by PECVD

Nanostructure growth

Oxford Instruments now offers a range of process solutions for nanostructure growth, taking in carbon nanotubes (CNT), silicon and other material nanowires, nanometre thin film deposition and III-V/II-VI/nitride semicondonductor epitaxial growth.

Nanostructure growth solutions

Our range of "bottom-up" nanostructure growth solutions encompasses:

  • Carbon nanotubes
    • Plasma-enhanced chemical vapour deposition (PECVD) growth of carbon nanotubes (CNT) in our Nanofab tools
  • Nanowires
    • PECVD growth of a wide range of nanowire materials in our Nanofab tools
  • Nanometre thin films
    • Atomic layer deposition (ALD) for ultra-thin film deposition using our FlexAL® and OpALTM  ALD tools, with highly conformal (~100%), pinhole-free coverage of a wide range of oxides, nitrides, single element metals and nanolaminates materials, with nanometre-level control of film thickness
  • Epitaxial growth of III-V, II-VI and nitride materials
    • Molecular beam epitaxy (MBE) in our V80H, V90 and V100 reactors

Nanoscale Si etching

For "top-down" nanostructure creation, nanometre scale features can be etched in silicon using our Plasmalab®System100, PlasmalabSystem133 and Plasmalab80Plus plasma etch tools.

 

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Al2O3 deposition by FlexAL plasma atomic layer deposition (ALD) tool

Al2O3 deposition by FlexAL plasma atomic layer deposition (ALD) tool

FlexAL remote plasma and thermal atomic layer deposition (ALD) tool

FlexAL remote plasma and thermal atomic layer deposition (ALD) tool

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