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Nanostructure growth
Oxford Instruments now offers a range of process solutions for nanostructure growth, taking in carbon nanotubes (CNT), silicon and other material nanowires, nanometre thin film deposition and III-V/II-VI/nitride semicondonductor epitaxial growth.
Nanostructure growth solutions
Our range of "bottom-up" nanostructure growth solutions encompasses:
- Carbon nanotubes
- Plasma-enhanced chemical vapour deposition (PECVD) growth of carbon nanotubes (CNT) in our Nanofab tools
- Nanowires
- PECVD growth of a wide range of nanowire materials in our Nanofab tools
- Nanometre thin films
- Atomic layer deposition (ALD) for ultra-thin film deposition using our FlexAL® and OpALTM ALD tools, with highly conformal (~100%), pinhole-free coverage of a wide range of oxides, nitrides, single element metals and nanolaminates materials, with nanometre-level control of film thickness
- Epitaxial growth of III-V, II-VI and nitride materials
- Molecular beam epitaxy (MBE) in our V80H, V90 and V100 reactors
Nanoscale Si etching
For "top-down" nanostructure creation, nanometre scale features can be etched in silicon using our Plasmalab®System100, PlasmalabSystem133 and Plasmalab80Plus plasma etch tools.
Please select from the list of sub-applications within our "Product Finder" to help you locate the correct product, or choose from the list of "Related Products" in the section beneath it. Alternatively, please contact us to discuss your need, and our expert sales and applications staff will be pleased to help you select the right process and tools to meet your requirements.
Al2O3 deposition by FlexAL plasma atomic layer deposition (ALD) tool
FlexAL remote plasma and thermal atomic layer deposition (ALD) tool
Product finder
Related Information
- About atomic layer deposition (ALD)
- Plasma atomic layer deposition (ALD) and its benefits
- Global Customer Support & Service - Oxford Instruments Plasma Technology
- Deposition and growth
- Etching, deposition and growth
- High brightness LEDs (HB LEDs)
- Ion beam etch and deposition systems
- Technologies and Devices International (TDI)
Downloads and Links
Related Products
- ECellAs Arsenic cracker source
- FlexAL atomic layer deposition (ALD) tool
- Ionfab®300Plus
- Nanofab
- OpAL atomic layer deposition (ALD) tool
- Plasmalab®800Plus
- Plasmalab®80Plus
- Plasmalab®System100
- Plasmalab®System133
- Plasmalab®System400 magnetron sputter tool
- Plasmalab®µEtch300
- Plasmalab®µEtchEL
- TEOS PECVD module
- V100 molecular beam epitaxy (MBE) systems
- V80H molecular beam epitaxy (MBE) systems
- V90 molecular beam epitaxy (MBE) systems
